Thin Film and Vacuum Technology (Theory)

Paper Code: 
CNST 503
Credits: 
04
Contact Hours: 
60.00
Max. Marks: 
100.00
Objective: 

Course Objectives:

This course will enable the students to –

  1. To provide knowledge of basics of Vacuum technology and KTG to solve to various types of applications and problems
  2. To make students understand the synthesis, thermodynamics of thin film growth and characterization through different techniques.

 

Course outcomes (COs):

Course

Learning outcomes

(at course level)

Learning and teaching strategies

Assessment

Strategies

Course Code

Course Title

CNST 503

 

 

Thin film and Vacuum Technology (Theory)

 

 

 

The students will be able to:

CO:163. Learn the fundamentals of Vacuum Technology and Kinetic Theory of Gases.

 

CO:164. Understand the mechanism and thermodynamics of thin film growth through various theories.

 

CO:165. Explore various physical and chemical methods for synthesis of thin film.

 

CO:166. Acquaint the student of thin film characterization.

Approach in teaching:

Interactive Lectures, Discussion, Tutorials, , Demonstration, Problem Solving in tutorials

 

 

Learning activities for the students:

Self-learning assignments, Effective questions, Seminar presentation, Solving numericals. Additional learning through online videos.

Class test, Semester end examinations, Quiz, Solving problems, Assignments, Presentations

 

12.00
Unit I: 
I

Vacuum Technology: Gas Laws, Kinetic Theory of Gases, Conductance and Throughput, Gas Sources in a Vacuum Chamber, Vacuum Pumps.

12.00
Unit II: 
II
Thermodynamics and Thin Film growth, Film Formation and Structure: Capillarity Theory, Atomistic Nucleation processes, Cluster Coalescence, Grain Structure of Films.
 
12.00
Unit III: 
III

Physical Vapor Deposition: Sputtering (Plasma Physics (DC Diode), rf Plasmas, Magnetic Fields in Plasmas, Sputtering Mechanisms), Evaporation. Chemical Vapor Deposition: Mechanisms, Materials, Chemistries, Systems. 

11.00
Unit IV: 
IV

Etching: Wet Chemical Etching (Mechanisms, Materials and Chemistries), Dry Plasma Etching/Reactive Ion Etching (Mechanisms, Materials and Chemistries).

13.00
Unit V: 
V

Thin Film Characterization: X-Ray Diffraction, Scanning Ion Conductance Microscopy, Molecular and spectroscopic analysis, XPS introduction, concept & instrumentation, Differential Thermal Analyses (DTA) Particle Size Analysis, Nuclear Magnetic Resonance (NMR).

References: 
1.Thin Film Deposition and Patterning: R. K. Waits, American Vacuum Society, 1998. 
2.The Materials Science of Thin Films: M. Ohring, Academic Press, Boston, 1991.
3.Physics of Thin Films: Ludmila Eckertova, 2nd Plenum Press New York, 1986.
4. Thin Film Phenomena: K. L. Chopra, McGraw-Hill, 1969.
 
 
Academic Year: 
2023-2024
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